Charge instability of atomic-layer deposited TaSiOx insulators on Si, InP, and In0.53Ga0.47As

Publication:

2012

Journal article

Author(s)

;

Chou, H.Y.

;

Thoan, N.H.

;

;

;

;

Applied Physics Letters

1867 since deposited on 2021-10-20

1last week

Acq. date: 2026-02-26