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Ultralow gate leakage current density of Ge metal-oxide-semiconductor capacitor passivated by in situ N2 plasma pretreatment
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Authors
Deng, Shaoren
;
Xie, Qi
;
Schaekers, Marc
;
Lin, Dennis
;
Caymax, Matty
;
Delabie, Annelies
;
Van den Berghe, Sven
;
Qu, Xinping
;
Deduytsche, Davy
;
Detavernier, Christophe
Conference
Materials for Advanced Metallization - MAM
Title
Ultralow gate leakage current density of Ge metal-oxide-semiconductor capacitor passivated by in situ N2 plasma pretreatment
Publication type
Meeting abstract
Embargo date
9999-12-31
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