Publication:
Effective work function engineering for aggressively scaled planar and FinFET-based devices with high-k last replacement metal gate technology
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1957 since deposited on 2021-10-20
4last month
3last week
Acq. date: 2026-01-11
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Views
1957 since deposited on 2021-10-20
4last month
3last week
Acq. date: 2026-01-11
Citations