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Nanoscale and device level electrical behavior of annealed ALD Hf-based gate oxide stacks grown with different precursors
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1956 since deposited on 2021-10-21
1last month
Acq. date: 2026-01-11
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Metrics
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1956 since deposited on 2021-10-21
1last month
Acq. date: 2026-01-11
Citations