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Scaled X-bar TiN/HfO2/TiN RRAM cells processed with optimised plasma enhanced atomic layer deposition (PEALD) for TiN electrode
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Authors
Chen, Yangyin
;
Goux, Ludovic
;
Pantisano, Luigi
;
Swerts, Johan
;
Adelmann, Christoph
;
Mertens, Sofie
;
Afanasiev, Valeri
;
Wang, Xin Peng
;
Govoreanu, Bogdan
;
Degraeve, Robin
;
Kubicek, Stefan
;
Paraschiv, Vasile
;
Jossart, Nico
;
Altimime, Laith
;
Jurczak, Gosia
;
Kittl, Jorge
;
Groeseneken, Guido
;
Wouters, Dirk
ISSN
0167-9317
Journal
Microelectronic Engineering
Volume
112
Title
Scaled X-bar TiN/HfO2/TiN RRAM cells processed with optimised plasma enhanced atomic layer deposition (PEALD) for TiN electrode
Publication type
Journal article
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