Publication:
Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch
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1926 since deposited on 2021-10-21
3last month
Acq. date: 2026-08-06
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Statistics
Views
1926 since deposited on 2021-10-21
3last month
Acq. date: 2026-08-06
Citations