Negative bias temperature instabilities in SiGe-pMOSFETs with SiO2/HfO2 gate dielectrics

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Authors
Duan, G.X; Zhang, C. X.; Zhang, E.X.; Fleetwood, D.M.; Schrimpf, R.D; Reed, R. A.; Linten, Dimitri; Mitard, Jerome
Conference
44th IEEE Semcionductor Interface Specialists Conference - SISC
Title
Negative bias temperature instabilities in SiGe-pMOSFETs with SiO2/HfO2 gate dielectrics
Publication type
Meeting abstract
Embargo date
9999-12-31
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