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Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
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Authors
Han, Jeong Hwan
;
Ungur, Elisaveta
;
Franquet, Alexis
;
Opsomer, Karl
;
Conard, Thierry
;
Moussa, Alain
;
De Gendt, Stefan
;
Van Elshocht, Sven
;
Adelmann, Christoph
ISSN
2050-7526
Issue
37
Journal
Journal of Materials Chemistry C
Volume
1
Title
Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics
Publication type
Journal article
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