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High Ge content SiGe selective processes for source/drain in manufacturing the next generations of pMOS transistors
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Authors
Hikavyy, Andriy
;
Vanherle, Wendy
;
Witters, Liesbeth
;
Vincent, Benjamin
;
Dekoster, Johan
;
Loo, Roger
DOI
10.1149/2.009306jss
ISSN
2162-8769
Issue
6
Journal
ECS Journal of Solid State Science and Technology
Volume
2
Title
High Ge content SiGe selective processes for source/drain in manufacturing the next generations of pMOS transistors
Publication type
Journal article
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