Publication:

Sealing of low-k dielectric (k=2.0) with self-assembled monolayers (SAMs) for the atomic layer deposition (ALD) of TiN

Date

2013

Proceedings Paper

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Author(s)

;

Levrau, Elisabeth

;

;

Meersschaut, Johan

;

Verdonck, Patrick

;

Struyf, Herbert

;

Detavernier, Chrostophe

;

Baklanov, Mikhaïl

;

De Feyter, Steven

;

Statistics

1915 since deposited on 2021-10-21

Acq. date: 2026-02-24