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Highly scalable effective work function engineering approach for multi-VT modulation of planar and FinFET-based RMG high-k last devies for (sub-)22nm nodes
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Highly scalable effective work function engineering approach for multi-VT modulation of planar and FinFET-based RMG high-k last devies for (sub-)22nm nodes
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Veloso, Anabela
;
Boccardi, Guillaume
;
Ragnarsson, Lars-Ake
;
Higuchi, Yuichi
;
Lee, Jae Won
;
Simoen, Eddy
;
Roussel, Philippe
;
Cho, Moon Ju
;
Chew, Soon Aik
;
Schram, Tom
;
Dekkers, Harold
;
Van Ammel, Annemie
;
Witters, Thomas
;
Brus, Stephan
;
Dangol, Anish
;
Paraschiv, Vasile
;
Vecchio, Emma
;
Shi, Xiaoping
;
Sebaai, Farid
;
Kellens, Kristof
;
Heylen, Nancy
;
Devriendt, Katia
;
Richard, Olivier
;
Bender, Hugo
;
Chiarella, Thomas
;
Arimura, Hiroaki
;
Thean, Aaron
;
Horiguchi, Naoto
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Acq. date: 2025-12-09
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2045
since deposited on 2021-10-21
2
last month
Acq. date: 2025-12-09
Citations