Publication:
W versus Co–Al as gate fill-metal for aggressively scaled replacement high-k/metal gate devices for (Sub-)22nm technology nodes
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2002 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-11
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Metrics
Views
2002 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-11
Citations