Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
Impacts of process options on ESD device characteristics in sub-20nm bulk FinFET technology nodes
Publication:
Impacts of process options on ESD device characteristics in sub-20nm bulk FinFET technology nodes
Copy permalink
Date
2014
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chen, Shih-Hung
;
Lee, Jam-Wem
;
Linten, Dimitri
;
Scholz, Mirko
;
Song, Ming-Hsiang
;
Hellings, Geert
;
Boschke, Roman
;
Sibaja-Hernandez, Arturo
;
Groeseneken, Guido
Journal
Abstract
Description
Statistics
Views
1892
since deposited on 2021-10-22
Acq. date: 2026-07-27
Citations
Statistics
Views
1892
since deposited on 2021-10-22
Acq. date: 2026-07-27
Citations