Publication:

Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching

Date

2014

Meeting abstract

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Author(s)

de Marneffe, Jean-Francois

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;

Krishtab, Mikhail

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;

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;

Wen, Liang Gong

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;

Matsunaga, Koichi

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Nafus, Kathleen

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Boemmels, Juergen

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;

Baklanov, Mikhaïl

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Acq. date: 2026-02-25