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Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching
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Ultra-low damage integration of k= 2.3 periodic mesoporous oxide dielectric material using cryogenic etching
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Date
2014
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
de Marneffe, Jean-Francois
;
Zhang, Liping
;
Krishtab, Mikhail
;
Goodyear, Andy
;
Cooke, Mike
;
Heylen, Nancy
;
Ciofi, Ivan
;
Wen, Liang Gong
;
Wilson, Chris
;
Savage, Travis
;
Matsunaga, Koichi
;
Nafus, Kathleen
;
Boemmels, Juergen
;
Tokei, Zsolt
;
Baklanov, Mikhaïl
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1945
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Acq. date: 2025-12-09
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Views
1945
since deposited on 2021-10-22
2
last month
2
last week
Acq. date: 2025-12-09
Citations