Gate double patterning strategies for 10nm node FinFET devices

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Authors
Hody, Hubert; Paraschiv, Vasile; Hellin, David; Vandeweyer, Tom; Boccardi, Guillaume; Xu, Kaidong
Conference
Advanced Etch Technology for Nanopatterning III
Title
Gate double patterning strategies for 10nm node FinFET devices
Publication type
Meeting abstract
Embargo date
9999-12-31
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