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Conference contributions
Gate double patterning strategies for 10nm node FinFET devices
Publication:
Gate double patterning strategies for 10nm node FinFET devices
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Date
2014
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hody, Hubert
;
Paraschiv, Vasile
;
Hellin, David
;
Vandeweyer, Tom
;
Boccardi, Guillaume
;
Xu, Kaidong
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1997
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Acq. date: 2026-02-27
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Statistics
Views
1997
since deposited on 2021-10-22
1
last month
Acq. date: 2026-02-27
Citations