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Wet clean in BEOL interconnect: Post etch residue removal and material compatibility
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Authors
Kesters, Els
;
Le, Quoc Toan
;
Yu, David
;
Shen, Mary
;
Braun, Simon
;
Klipp, Andreas
;
Holsteyns, Frank
Conference
Ultra Clean Processing of Semiconductor Surfaces - UCPSS XII
Title
Wet clean in BEOL interconnect: Post etch residue removal and material compatibility
Publication type
Proceedings paper
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