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Back-channel-etch amorphous indium-gallium-zinc oxide thin-film transistors: The impact of source/drain metal etch and final passivation
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Acq. date: 2026-10-04
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Acq. date: 2026-10-04
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1 since deposited on 2021-10-22
Acq. date: 2026-10-04
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2061 since deposited on 2021-10-22
3last month
2last week
Acq. date: 2026-10-04
Citations