Authors

Veloso, Anabela; Lee, Jae Woo; Simoen, Eddy; Ragnarsson, Lars-Ake; Arimura, Hiroaki; Cho, Moon Ju; Boccardi, Guillaume; Thean, Aaron; Horiguchi, Naoto

Conference

Dielectrics for Nanosystems 6: Materials Science, Processing, Reliability, and Manufacturing

Title

Replacement metal gate/high-k last technology for aggressively scaled planar and FinFET-based devices

Publication type

Proceedings paper

Embargo date

9999-12-31