Authors

Wostyn, Kurt; Dhayalan, Sathish Kumar; Hikavyy, Andriy; Loo, Roger; Douhard, Bastien; Moussa, Alain; Rondas, Dirk; Kenis, Karine; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; Profijt, Harald

Conference

Ultra Clean Processing of Semiconductor Surfaces XII

Title

HF-last wet clean in combination with a low temperature GeH4-assisted HCl in-situ clean prior to Si0.8Ge0.2-on-Si epitaxial growth

Publication type

Proceedings paper