Authors

Buhler, Rudolf; Eneman, Geert; Favia, Paola; Witters, Liesbeth; Vincent, Benjamin; Hikavyy, Andriy; Loo, Roger; Bender, Hugo; Collaert, Nadine; Simoen, Eddy; Martino, Joao; Claeys, Cor

ISSN

0018-9383

Issue

4

Journal

IEEE Transactions on Electron Devices

Volume

62

Title

TCAD strain calibration versus nanobeam diffraction of source/drain stressors for Ge MOSFETs

Publication type

Journal article

Embargo date

9999-12-31