Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas

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Authors

Leroy, F.; Zhang, Liping; Tillocher, T.; Yatsuda, K.; Maekawa, K; Nishimura, E; Lefaucheux, P; de Marneffe, Jean-Francois; Baklanov, Mikhaïl; Dussart, R

ISSN

0022-3727

Issue

43

Journal

Journal of Physics D: Applied Physics

Volume

48

Title

Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas

Publication type

Journal article

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