Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage

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Authors

Rakhimova, T.; Lopaev, D.; Mankelevich, Y.; Rakhimov, A.; Zyryanov, S.; Kurchikov, K.; Novikova, N.; Baklanov, Mikhaïl

ISSN

0022-3727

Issue

17

Journal

Journal of Physics D: Applied Physics

Volume

48

Title

Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage

Publication type

Journal article

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