Publication:

1.5×10-9 Ω·cm² Contact Resistivity on Highly Doped Si:P Using Ge Pre-amorphization and Ti Silicidation

Date

2015

Proceedings Paper

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Files

32212.pdf 1.66 MB

Author(s)

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Schaekers, Marc

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Demuynck, Steven

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Chiarella, Thomas

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Ragnarsson, Lars-Ake

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Kubicek, Stefan

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Everaert, Jean-Luc

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Horiguchi, Naoto

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Collaert, Nadine

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De Meyer, Kristin

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