The imec iN7 EUV platform: M2-Block and Via patterning developments

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Authors
Bekaert, Joost; Franke, Joern-Holger; Mao, Ming; Lariviere, Stephane; Decoster, Stefan; Di Lorenzo, Paolo; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Hendrickx, Eric; Gallagher, Emily; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Timoshkov, Vadim; Kiers, Ton; Maslow, Mark
Conference
International Symposium on Extreme Ultraviolet Lithography - EUVL
Title
The imec iN7 EUV platform: M2-Block and Via patterning developments
Publication type
Proceedings paper
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