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300mm wafer level CVD-Mn/iodine-CVD-Cu-based metallization study for advanced copper interconnections
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Authors
Jourdan, Nicolas
;
Cellier, Daniel
;
Van Elshocht, Sven
;
Boemmels, Juergen
;
Tokei, Zsolt
Conference
Materials for Advanced Metallization Conference - MAM
Title
300mm wafer level CVD-Mn/iodine-CVD-Cu-based metallization study for advanced copper interconnections
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