Authors

Yu, Hao; Schaekers, Marc; Peter, Antony; Pourtois, Geoffrey; Rosseel, Erik; Lee, Joon-Gon; Song, Woo-Bin; Shin, Keo Myoung; Everaert, Jean-Luc; Chew, Soon Aik; Demuynck, Steven; Kim, Daeyong; Barla, Kathy; Mocuta, Anda; Horiguchi, Naoto; Thean, Aaron; Collaert, Nadine; De Meyer, Kristin

ISSN

0018-9383

Issue

12

Journal

IEEE Transactions on Electron Devices

Volume

63

Title

Titanium silicide on Si:P with precontact amorphization implantation treatment: contact resistivity approaching 1×10-9 Ohm-cm²

Publication type

Journal article

Embargo date

9999-12-31