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Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
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Authors
Zotovich, Alexey
;
El Otell, Ziad
;
de Marneffe, Jean-Francois
;
Proshina, Olga
;
Lopaev, Dimitri
;
Rakhimova, Tatyana
;
Baklanov, Mikhaïl
ISSN
0963-0252
Issue
5
Journal
Plasma Sources Science and Technology
Volume
25
Title
Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Publication type
Journal article
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