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Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)
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Authors
Chanson, Romain
;
Lefaucheux, Philippe
;
Dussart, Remi
;
Shen, Peng
;
Urabe, Keiichiro
;
Dussarat, Christian
;
Maekawa, Kaoru
;
yatsuda, koichi
;
Tahara, Shigeru
;
de Marneffe, Jean-Francois
Conference
iplasmaNano-VIII: 8th International Conference on Plasma Nanoscience
Title
Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)
Publication type
Meeting abstract
Embargo date
9999-12-31
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