Publication:
Reliability study of ferroelectric Al:HfO2 thin films for DRAM and NAND applications
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1966 since deposited on 2021-10-24
2last month
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Acq. date: 2026-08-04
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Statistics
Views
1966 since deposited on 2021-10-24
2last month
1last week
Acq. date: 2026-08-04
Citations