Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

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Authors
Lazzarino, Frederic; Paolillo, Sara; Antony, Peter; De Roest, David; Seong, TaeGeun; Wu, Yizhi; Decoster, Stefan; Rutigliani, Vito; Lorusso, Gian; Constantoudis, Vassilios; Van Elshocht, Sven; Piumi, Daniele; Barla, Kathy
Conference
Advances in Patterning Materials and Processes XXXIV
Title
Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Publication type
Proceedings paper
Embargo date
9999-12-31
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