Integrated approach to improving local CD uniformity in EUV patterning

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Authors
Liang, Andrew; Hermans, Jan; Tran, Tim; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Wise, Rich; Dusa, Mircea; Reddy, Sirish; Singhal, Akhil; Van Schravendijk, Bart; Dixit, Girish; Shamma, Nader
Conference
Extreme Ultraviolet (EUV) Lithography VIII
Title
Integrated approach to improving local CD uniformity in EUV patterning
Publication type
Proceedings paper
Embargo date
9999-12-31
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