Authors

Proost, Joris; Li, Hua; Brijs, Bert; Witvrouw, Ann; Maex, Karen

Conference

Proceedings of the IEEE 1998 International Interconnect Technology Conference

Title

Electromigration behaviour of 0.3 μm damascene vs. plasma-etched interconnects: a lifetime and drift analysis

Publication type

Proceedings paper

Embargo date

9999-12-31