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Epitaxial CVD growth of ultra-thin Si passivation layers on Ge using Si4H10 to enable growth temperatures down to 330 °C
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Authors
Loo, Roger
;
Vanherle, Wendy
;
Arimura, Hiroaki
;
Cott, Daire
;
Witters, Liesbeth
;
Douhard, Bastien
;
Mitard, Jerome
;
Collaert, Nadine
Conference
10th International Conference on Silicon Epitaxy and heterostructures
Title
Epitaxial CVD growth of ultra-thin Si passivation layers on Ge using Si4H10 to enable growth temperatures down to 330 °C
Publication type
Proceedings paper
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