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Characterization and benchmarking of the low inter-tier thermal resistance of 3D hybrid Cu/dielectric wafer-to-wafer bonding
Publication:
Characterization and benchmarking of the low inter-tier thermal resistance of 3D hybrid Cu/dielectric wafer-to-wafer bonding
Date
2017-03
Journal article
https://doi.org/10.1115/1.4035597
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2.75 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Oprins, Herman
;
Cherman, Vladimir
;
Webers, Tomas
;
Salahouelhadj, Abdellah
;
Kim, Soon-Wook
;
Peng, Lan
;
Van der Plas, Geert
;
Beyne, Eric
Journal
Journal of Electronic Packaging
Abstract
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Views
1938
since deposited on 2021-10-24
Acq. date: 2025-10-27
Citations
Metrics
Views
1938
since deposited on 2021-10-24
Acq. date: 2025-10-27
Citations