Publication:
Highly doped low-temperature Si:P growth for source/drain formation in advanced Si nFETs
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1971 since deposited on 2021-10-24
3last month
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Acq. date: 2026-04-28
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Statistics
Views
1971 since deposited on 2021-10-24
3last month
1last week
Acq. date: 2026-04-28
Citations