Feasibility of 250 nm gate patterning using i-line with OPC

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Authors

Van Driessche, Veerle; Finders, Jo; Tritchkov, Alexander; Ronse, Kurt; Van den hove, Luc; Tzviatkov, Plamen

Journal

Microelectronic Engineering

Volume

41/42

Title

Feasibility of 250 nm gate patterning using i-line with OPC

Publication type

Journal article

Embargo date

9999-12-31

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