Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes

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Authors
Halder, Sandip; Cerbu, Dorin; Leray, Philippe
Conference
SPIE International Conference on Extreme Ultraviolet Lithography 2018
Title
Using machine learning algorithms on review sem images to understand stochastic behaviour of EUV based patterning for n7 and smaller nodes
Publication type
Oral presentation
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