On ESD gate dielectric reliability in 14nm finFET and horizontal NW technology

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Authors
Hellings, Geert; Chen, Shih-Hung; Scholz, Mirko; Simicic, Marko; Schram, Tom; Ragnarsson, Lars-Ake; Horiguchi, Naoto; Linten, Dimitri
Conference
International Electrostatic Discharge Workshop - IEW
Title
On ESD gate dielectric reliability in 14nm finFET and horizontal NW technology
Publication type
Proceedings paper
Embargo date
9999-12-31
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