Publication:

Si/SiGe superlattice I/O finFETs in a vertically-stacked gate-all-around horizontal nanowire technology

Date

2018

Proceedings Paper

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38147.pdf 783.3 KB

Author(s)

Hellings, Geert

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Subirats, Alexandre

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Ragnarsson, Lars-Ake

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Chen, Shih-Hung

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Parvais, Bertrand

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Boudier, Dimitri

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;

Machillot, Jerome

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Linten, Dimitri

;

Horiguchi, Naoto

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1961 since deposited on 2021-10-25

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Acq. date: 2026-08-06