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Conference contributions
Selective wet etching in fabricating SiGe and Ge nanowires for gate-all-around MOSFETs
Publication:
Selective wet etching in fabricating SiGe and Ge nanowires for gate-all-around MOSFETs
Date
2018
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Liu, W.D.
;
Lee, Y.C.
;
Sekiguchi, R.
;
Yoshida, Y.
;
Komori, K.
;
Wostyn, Kurt
;
Sebaai, Farid
;
Holsteyns, Frank
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1857
since deposited on 2021-10-25
Acq. date: 2025-10-29
Citations
Metrics
Views
1857
since deposited on 2021-10-25
Acq. date: 2025-10-29
Citations