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Highly-stable plasmon induced hot hole transfer into silicon via a SrTiO3 passivation interface
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Authors
Matsu, Takayuki
;
Li, Yi
;
Hsu, Mark
;
Merckling, Clement
;
Oulton, Rupert
;
Cohen, Lesley
;
Maier, Stefan
ISSN
1616-301X
Issue
17
Journal
Advanced Functional Materials
Volume
28
Title
Highly-stable plasmon induced hot hole transfer into silicon via a SrTiO3 passivation interface
Publication type
Journal article
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