Authors

Blanco, Victor; Paolillo, Sara; van der Veen, Marleen; Lariviere, Stephane; Lorusso, Gian; De Poortere, Etienne; Tabery, Cyrus; Qiao, Fu; Lai, Shu-yu; Kea, Marc; Wang, Luke; Su, Yu Chi; Oh, Joe; Huang, Jim; Chen, Jimmy; Huang, Jonathan

Conference

International Conference on Extreme Ultraviolet Lithography 2019

Title

Large area EUV via yield analysis for single damascene process: voltage contrast, CD and defect metrology

Publication type

Proceedings paper