Publication:
Epitaxial growth of Ga doped SiGe for reduction of contact resistance in finFET source/drain materials
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1960 since deposited on 2021-10-27
5last month
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Acq. date: 2026-08-07
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Statistics
Views
1960 since deposited on 2021-10-27
5last month
3last week
Acq. date: 2026-08-07
Citations