Authors

Rosseel, Erik; Tirrito, Matteo; Porret, Clément; Douhard, Bastien; Meersschaut, Johan; Hikavyy, Andriy; Loo, Roger; Horiguchi, Naoto; Pourtois, Geoffrey; Nakazaki, Nobuya; Tolle, John

Conference

2nd Joint ISTDM / ICSI 2019 Conference

Title

Characterization of highly doped Si:P, Si:As and Si:P:As Epi layers for source/drain epitaxy

Publication type

Meeting abstract

Embargo date

9999-12-31