The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxide

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Authors
Detavernier, C.; Alves Donaton, Ricardo; Maex, Karen; Jin, S.; Bender, Hugo; Van Meirhaeghe, R.; Cardon, F.
Conference
Advanced Interconnects and Contacts
Title
The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxide
Publication type
Proceedings paper
Embargo date
9999-12-31
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