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Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis
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Authors
Abrenica, Graniel
;
Lebedev, Mikhail
;
Fingerle, Mathias
;
Arnauts, Sophia
;
Bazzazian, Nina
;
Calvet, Wolfram
;
Porret, Clément
;
Bender, Hugo
;
Mayer, Thomas
;
De Gendt, Stefan
;
van Dorp, Dennis
ISSN
2050-7526
Issue
29
Journal
Journal of Materials Chemistry C
Volume
8
Title
Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis
Publication type
Journal article
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