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Total-ionizing-dose effects and low-frequency noise in 30-nm gate-length Bulk and SOI FinFETs with SiO2/HfO2 gate delectrics
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Authors
Gorchichko, M.
;
Cao, Y.
;
Zhang, E.X.
;
Yan, D.
;
Gong, H.
;
Zhao, S.E.
;
Wang, P.
;
Jiang, R.
;
Liang, C.
;
Fleedwood, D.M.
;
Schrimpf, R.D.
;
Reed, R.A.
;
Linten, Dimitri
ISSN
0018-9499
Issue
1
Journal
IEEE Transactions on Nuclear Science
Volume
67
Title
Total-ionizing-dose effects and low-frequency noise in 30-nm gate-length Bulk and SOI FinFETs with SiO2/HfO2 gate delectrics
Publication type
Journal article
Embargo date
9999-12-31
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