0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack

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Authors
Kubicek, Stefan; Jansen, Philippe; Badenes, Gonçal; Schaekers, Marc; Kol'dyaev, Victor; Deferm, Ludo; De Meyer, Kristin; Kerr, Daniel; Naem, Abdalla
Conference
ULSI Process Integration. Proceedings of the First International Symposium
Title
0.13µm CMOS technology with optimized poly-Si / NO-oxide gate stack
Publication type
Proceedings paper
Embargo date
9999-12-31
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