Publication:
FEOL dry etch process challenges of ultimate FinFET scaling and next generation device architectures beyond N3
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2069 since deposited on 2021-10-29
3last month
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Acq. date: 2026-04-26
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Statistics
Views
2069 since deposited on 2021-10-29
3last month
2last week
Acq. date: 2026-04-26
Citations