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FEOL dry etch process challenges of ultimate FinFET scaling and next generation device architectures beyond N3
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Authors
Tao, Zheng
;
Zhang, Liping
;
Dupuy, Emmanuel
;
Chan, BT
;
Altamirano Sanchez, Efrain
;
Lazzarino, Frederic
Conference
Advanced Etch Technology for Nanopatterning IX
Title
FEOL dry etch process challenges of ultimate FinFET scaling and next generation device architectures beyond N3
Publication type
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