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Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling
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Authors
Oniki, Yusuke
;
Ragnarsson, Lars-Ake
;
Hideaki, Iino
;
Cott, Daire
;
Chan, BT
;
Sebaai, Farid
;
Hopf, Toby
;
Dekkers, Harold
;
Dentoni Litta, Eugenio
;
Altamirano Sanchez, Efrain
;
Holsteyns, Frank
;
Horiguchi, Naoto
Conference
International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
Title
Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling
Publication type
Proceedings paper
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