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Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling
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Challenges and solutions of replacement metal gate patterning to enable gate-all-around device scaling
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Date
2021
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Oniki, Yusuke
;
Ragnarsson, Lars-Ake
;
Hideaki, Iino
;
Cott, Daire
;
Chan, BT
;
Sebaai, Farid
;
Hopf, Toby
;
Dekkers, Harold
;
Dentoni Litta, Eugenio
;
Altamirano Sanchez, Efrain
;
Holsteyns, Frank
;
Horiguchi, Naoto
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2343
since deposited on 2021-10-31
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last month
1
last week
Acq. date: 2026-01-06
Citations
Metrics
Views
2343
since deposited on 2021-10-31
11
last month
1
last week
Acq. date: 2026-01-06
Citations